PECVD system
Our PECVD system is capable of depositing hydrogenated diamond-like carbon coatings and silicated carbon coatings on most materials using an ambient temperature process.
PECVD reactor
System capable of depositing DLC and silicated thin film coatings
System specifications include:
- Large 50x50cm chamber allows for small scale batch production and coating of larger more complex components
- Low temperature deposition
- Silicated interlayer for improved adhesion
- Large range of possible sample size and material
Our PECVD system
Diamond-like Carbon characteristics include:
- Low friction and low adhesion surface
- Hard but flexible therefore wear resistant
- Chemically inert therefore corrosion resistant
- Atomically dense therefore diffusion resistant
- Biocompatible and anti-thrombogenic
DLC Properties
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Co-efficient of friction
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0.1 – 0.2
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Hardness HV
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900 - 4000
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Electrical resistivity
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106 – 1212 Ωm
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Corrosion resistance
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Acids, alkalis, saline – excellent
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Diffusion barriers
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For biomedical – limits, Ni/Co/Cr+ migration
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Coating thickness
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10 nm – 4 µm
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Max operating temperature
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Continuous 250 °C
Intermittent 350 °C
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Density
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1.5 – 2.2 x 103 kg/m3
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Thermal conductivity
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0.7 W/m·K
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Refractive index
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1.5 – 3.1
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Deposition temperature
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Ambient to 200 °C
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Mechanical engineering applications
- Cutting inserts, Drills, saws.
- Extrusion die, Injection mould
- Gears, Web plates
- Engine components
Bio-engineering applications
- Catheter
- Prosthetic replacement
- Stents
- Bypass Conduits
- Drug Delivery
Other applications
- Packaging
- Moulds
- Decorative / Jewellery